Electrical, Optical and Structural Properties of ZnO Thin Films Prepared
Küçük Resim Yok
Tarih
2013
Yazarlar
Dergi Başlığı
Dergi ISSN
Cilt Başlığı
Yayıncı
Selçuk Üniversitesi
Erişim Hakkı
info:eu-repo/semantics/openAccess
Özet
ZnO films with hexagonal wurtzite structure were deposited at 3000C substrate temperature. Thin (200 nm) zinc oxide films were grown by PLD on soda-lime glass with the aid of a 248 nm pulsed excimer laser that was ablating a pure (99.9%) Zn target. The substrates were kept at room temperature and the pressure of the ambient reactive gas oxygen was 10 and 20 Pa. In this work, we present our investigations on how oxygen pressure affects the optical, electrical and structural properties of the deposited films. We performed measurements on absorbance and transmittance for the optical properties, recorded the Current-Voltage (I-V) characteristic examined by a four-point probe to measure the resistivity of the films and x-ray patterns to see their structural properties.
Açıklama
Anahtar Kelimeler
Pulsed laser deposition, ZnO thin films, UV; XRD, Electrical Characterization
Kaynak
Journal of Selcuk University Natural and Applied Science
WoS Q Değeri
Scopus Q Değeri
Cilt
2
Sayı
1
Künye
Fiat, S., Cankaya, G., Kompitsas, M. (2013).Electrical, Optical and Structural Properties of ZnO Thin Films Prepared. Journal of Selcuk University Natural and Applied Science, 2, (1), 44-53.
