Physical deposition of carbon doped titanium nitride film by DC magnetron sputtering for metallic implant coating use

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dc.contributor.authorSedira, Sofiane
dc.contributor.authorAchour, Slimane
dc.contributor.authorAvci, Ahmet
dc.contributor.authorEskizeybek, Volkan
dc.date.accessioned2020-03-26T18:58:24Z
dc.date.available2020-03-26T18:58:24Z
dc.date.issued2014
dc.departmentSelçuk Üniversitesien_US
dc.description.abstractAlloys exposed to tissue environment are at risk to corrosive breakdown. The corrosion behaviour of carbon doped titanium nitride films was studied. The C-TiN films were deposited by DC magnetron sputtering. The obtained films were investigated to be used as protective layers for medical implants. The films were analysed using XRD, SEM with EDX, FTIR, Raman, UV-vis and potentiodynamic polarization. Analysis indicated that doping with carbon in low concentration led to form titanium carbide. The measured values of corrosion current densities (I-corr, (substrate) = 2.020 mu A/cm(2), I-corr, (coating) = 0.175 mu A/cm(2)) indicate that the deposited films improved the corrosion resistance of the pure titanium. Comparison between the corrosion current densities of two samples (uncoated and coated pure titanium) showed a reduction of 91% in corrosion current density for coated Ti compared to the uncoated one. (C) 2014 Elsevier B. V. All rights reserved.en_US
dc.identifier.doi10.1016/j.apsusc.2014.01.010en_US
dc.identifier.endpage85en_US
dc.identifier.issn0169-4332en_US
dc.identifier.issn1873-5584en_US
dc.identifier.scopusqualityQ1en_US
dc.identifier.startpage81en_US
dc.identifier.urihttps://dx.doi.org/10.1016/j.apsusc.2014.01.010
dc.identifier.urihttps://hdl.handle.net/20.500.12395/31066
dc.identifier.volume295en_US
dc.identifier.wosWOS:000331614300013en_US
dc.identifier.wosqualityQ1en_US
dc.indekslendigikaynakWeb of Scienceen_US
dc.indekslendigikaynakScopusen_US
dc.language.isoenen_US
dc.publisherELSEVIER SCIENCE BVen_US
dc.relation.ispartofAPPLIED SURFACE SCIENCEen_US
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanıen_US
dc.rightsinfo:eu-repo/semantics/closedAccessen_US
dc.selcuk20240510_oaigen_US
dc.subjectAlloysen_US
dc.subjectTitaniumen_US
dc.subjectPotentiodynamic polarizationen_US
dc.subjectDissolution kineticen_US
dc.subjectCorrosionen_US
dc.titlePhysical deposition of carbon doped titanium nitride film by DC magnetron sputtering for metallic implant coating useen_US
dc.typeArticleen_US

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