Effect of substrate temperature on initiated plasma enhanced chemical vapor deposition of PHEMA thin films

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dc.contributor.authorGursoy, Mehmet
dc.contributor.authorKaraman, Mustafa
dc.date.accessioned2020-03-26T19:02:10Z
dc.date.available2020-03-26T19:02:10Z
dc.date.issued2015
dc.departmentSelçuk Üniversitesien_US
dc.description20th Biennial European Conference on Chemical Vapor Deposition (EuroCVD) -- JUL 12-17, 2015 -- Sempach, SWITZERLANDen_US
dc.description.abstractPoly(2-hydroxyethyl methacrylate) (PHEMA) thin films were deposited on silicon wafers by initiated plasma enhanced chemical vapour deposition (i-PECVD) method at different substrate temperatures. Di tert-butyl peroxide (TBPO) was used as an initiator, and all deposition experiments were performed at 3: 1 monomer to initiator flow ratio. Deposition rates up to 44 nm/min were observed at relatively low plasma power depending on the deposition conditions. The high deposition rates at low plasma powers were attributed to the usage of the initiator. Fourier transform infrared spectroscopy (FTIR) and X-ray photoelectron spectroscopy (XPS) analyses of the deposits indicated very high retention of hydroxyl and carbonyl functionalities especially for the polymers deposited at low plasma powers. Water contact angle measurements were carried out to determine the wettability of as-deposited PHEMA surfaces. This study indicated that the substrate temperature is an important parameter determining the polymerization rate. Being a dry, low-cost, reliable and environmentally friendly process, the i-PECVD technique developed in this study can be used to deposit other functional polymers. The water contact angle measurement images of PHEMA thin films at different substrate temperatures. (C) 2015 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheimen_US
dc.description.sponsorshipSTREM Chem Inc, KEMSTREAM, ARBOR Fluidtec AG, Comelec S A, Wiley VCH Verlag GmbH & Co KGaA, Cost Herald, Swiss Assoc Mat Sci & Technolen_US
dc.identifier.doi10.1002/pssc.201510034en_US
dc.identifier.endpage1010en_US
dc.identifier.issn1862-6351en_US
dc.identifier.issue7en_US
dc.identifier.scopusqualityN/Aen_US
dc.identifier.startpage1006en_US
dc.identifier.urihttps://dx.doi.org/10.1002/pssc.201510034
dc.identifier.urihttps://hdl.handle.net/20.500.12395/32051
dc.identifier.volume12en_US
dc.identifier.wosWOS:000360157600025en_US
dc.identifier.wosqualityN/Aen_US
dc.indekslendigikaynakWeb of Scienceen_US
dc.indekslendigikaynakScopusen_US
dc.language.isoenen_US
dc.publisherVERLAG DR KOSTERen_US
dc.relation.ispartofPHYSICA STATUS SOLIDI C: CURRENT TOPICS IN SOLID STATE PHYSICS, VOL 12, NO 7en_US
dc.relation.ispartofseriesPhysica Status Solidi C-Current Topics in Solid State Physics
dc.relation.publicationcategoryKonferans Öğesi - Uluslararası - Kurum Öğretim Elemanıen_US
dc.rightsinfo:eu-repo/semantics/closedAccessen_US
dc.selcuk20240510_oaigen_US
dc.subjectpoly(2-hydroxyethyl methacrylate)en_US
dc.subjectchemical vapor depositionen_US
dc.subjectplasmaen_US
dc.subjectinitiatoren_US
dc.titleEffect of substrate temperature on initiated plasma enhanced chemical vapor deposition of PHEMA thin filmsen_US
dc.typeConference Objecten_US

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