Initiation of 2-Hydroxyethyl Methacrylate Polymerization by Tert-Butyl Peroxide in a Planar PECVD System
Küçük Resim Yok
Tarih
2016
Dergi Başlığı
Dergi ISSN
Cilt Başlığı
Yayıncı
WILEY-V C H VERLAG GMBH
Erişim Hakkı
info:eu-repo/semantics/closedAccess
Özet
This article reports on the deposition conditions and characterization of poly(2-hydroxyethyl methacrylate) thin films grown by initiated plasma enhanced chemical vapor deposition process. The plasma power is inductively coupled into the process chamber with a planar-coil antenna through a quartz window, and the substrate is cooled to promote physical adsorption of monomers on its surface. The introduction of the initiator allowed for film deposition at very low plasma powers (1W) and greatly improves the deposition rates. Fourier transform infrared (FTIR) and X-ray photoelectron spectroscopy (XPS) analyses confirmed that the chemical functionalities of the monomers are preserved to a good extent during the depositions that were carried out at low plasma powers. The deposition kinetics of PECVD-produced films from HEMA can be tailored by varying the substrate temperature. The apparent activation energies observed from PHEMA deposition kinetics with varying substrate temperatures are observed to be negative, which supports the hypothesis of the free radical polymerization mechanism in the PECVD PHEMA deposition.
Açıklama
Anahtar Kelimeler
initiator, PECVD, PHEMA, plasma polymer, substrate temperature
Kaynak
PLASMA PROCESSES AND POLYMERS
WoS Q Değeri
Q1
Scopus Q Değeri
Q2
Cilt
13
Sayı
4
